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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Holistic overlay control for multi-patterning process layers at the 10nm and 7nm nodes
Sanchez, Martha I., Ukraintsev, Vladimir A., Verstappen, Leon, Mos, Evert, Wardenier, Peter, Megens, Henry, Schmitt-Weaver, Emil, Bhattacharyya, Kaustuve, Adam, Omer, Grzela, Grzegorz, van Heijst, JooVolume:
9778
Year:
2016
Language:
english
DOI:
10.1117/12.2230390
File:
PDF, 1.42 MB
english, 2016