SPIE Proceedings [SPIE 18th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 16 September 1998)] 18th Annual BACUS Symposium on Photomask Technology and Management - Size matters: defect detectability in reticle and wafer inspection including advanced aerial image simulation for defect printability
Almog, Eli, Caldwell, Roger F., Chang, Fang C., Chen, J. Fung, Farrar, Nigel R., Karklin, Linard, Laidig, Thomas L., Sabouri, Saeed, Shen, Wayne P., Staud, Wolfgang, Wu, Clive, Zelenko, Jeremy, GrenonVolume:
3546
Year:
1998
Language:
english
DOI:
10.1117/12.332818
File:
PDF, 1.66 MB
english, 1998