SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Challenge to sub-0.1-μm pattern fabrication using an alternating phase-shifting mask in ArF lithography
Matsuo, Takahiro, Nakazawa, Keisuke, Ogawa, Tohru, Van den Hove, LucVolume:
3679
Year:
1999
Language:
english
DOI:
10.1117/12.354342
File:
PDF, 1.01 MB
english, 1999