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SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Experimental study of mask line edge roughness transfer in DUV and EUV lithography patterning process
Yan, Pei-yang, Zhang, Guojing, Abboud, Frank E., Grenon, Brian J.Volume:
3873
Year:
1999
Language:
english
DOI:
10.1117/12.373302
File:
PDF, 1.18 MB
english, 1999