SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Automatic macro inspection system
Kitamura, Toshiaki, Nakajima, Yasuharu, Matsumoto, Hiroyuki, Omori, Takeo, Komatsu, Koichiro, Sullivan, Neal T.Volume:
3998
Year:
2000
Language:
english
DOI:
10.1117/12.386514
File:
PDF, 2.09 MB
english, 2000