SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Using alicyclic polymers in top surface imaging systems to reduce line-edge roughness
Somervell, Mark H., Fryer, David S., Osborn, Brian, Patterson, Kyle, Cho, Sungseo, Byers, Jeff D., Willson, C. Grant, Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388311
File:
PDF, 3.84 MB
english, 2000