![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - Predicting thermomechanical distortions of optical reticles for 157-nm technology
Abdo, Amr Y., Engelstad, Roxann L., Beckman, William A., Mitchell, John W., Lovell, Edward G., Grenon, Brian J., Dao, Giang T.Volume:
4186
Year:
2001
Language:
english
DOI:
10.1117/12.410752
File:
PDF, 305 KB
english, 2001