SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - High-power laser-plasma x-ray source for lithography
Gaeta, Celestino J., Rieger, Harry, Turcu, I. C. Edmond, Forber, Richard A., Cassidy, Kelly L., Campeau, S. M., Powers, Michael F., Maldonado, J. R., Morris, James H., Foster, Richard M., Smith, HenryVolume:
4688
Year:
2002
Language:
english
DOI:
10.1117/12.472353
File:
PDF, 468 KB
english, 2002