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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Effects of soft pellicle frame curvature and mounting process on pellicle-induced distortions in advanced photomasks
Cotte, Eric P., Engelstad, Roxann L., Lovell, Edward G., Tanzil, Daniel, Eschbach, Florence O., Korobko, Yulia O., Fujita, Minoru, Nakagawa, Hiroaki, Yen, AnthonyVolume:
5040
Year:
2003
Language:
english
DOI:
10.1117/12.485474
File:
PDF, 540 KB
english, 2003