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SPIE Proceedings [SPIE Santa Cl - DL tentative - Santa Clara, CA (Saturday 15 September 1990)] Advanced Techniques for Integrated Circuit Processing - Reactive ion etching of deep isolation trenches using sulfur hexafluoride, chlorine, helium, and oxygen
Krawiec, Theresa M., Giammarco, Nicholas J., Bondur, James A., Turner, Terry R.Volume:
1392
Year:
1991
Language:
english
DOI:
10.1117/12.48921
File:
PDF, 683 KB
english, 1991