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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Inspection performances of the electron beam inspection system based on projection electron microscopy
Nagahama, Ichirota, Silver, Richard M., Onishi, Atsushi, Yamazaki, Yuichiro, Satake, Tohru, Noji, NobuharuVolume:
5375
Year:
2004
Language:
english
DOI:
10.1117/12.534909
File:
PDF, 173 KB
english, 2004