SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Sub 90nm DRAM patterning by using modified chromeless PSM at KrF lithography era
Kim, Young-Sik, Smith, Bruce W., Hyun, Yoon-Suk, Kong, Keun-Kyu, Kim, Hyeongsoo, Choi, Bong-HoVolume:
5754
Year:
2005
Language:
english
DOI:
10.1117/12.599216
File:
PDF, 1.14 MB
english, 2005