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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Experimental comparison of absolute PDI and lateral shearing interferometer
Zhu, Yucong, Silver, Richard M., Sugisaki, Katsumi, Okada, Masashi, Otaki, Katsura, Liu, Zhiqian, Ishii, Mikihiko, Kawakami, Jun, Saito, Jun, Murakami, Katsuhiko, Ouchi, Chidane, Hasegawa, Masanobu, KVolume:
5752
Year:
2005
Language:
english
DOI:
10.1117/12.600274
File:
PDF, 250 KB
english, 2005