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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Characterization of imaging performance: considering both illumination intensity profile and lens aberration
Ebihara, Takeaki, Smith, Bruce W., Saito, Hideyuki, Miyaharu, Takafumi, Okada, Shuichi, Shiode, Yoshihiro, Shiozawa, Takahisa, Yoshihara, ToshiyukiVolume:
5754
Year:
2005
Language:
english
DOI:
10.1117/12.600481
File:
PDF, 192 KB
english, 2005