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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Inverse lithography technology at chip scale
Lin, Benjamin, Flagello, Donis G., Shieh, Ming Feng, Sun, Jie-wei, Ho, Jonathan, Wang, Yan, Wu, Xin, Leitermann, Wolfgang, Lin, Orson, Lin, Jason, Liu, Yong, Pang, LinyongVolume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.656827
File:
PDF, 1.99 MB
english, 2006