SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Self-aligned resist patterning by backside flood exposure in photomask
Ha, Taejoong, Martin, Patrick M., Naber, Robert J., Gyun, Byunggu, Han, OscarVolume:
6349
Year:
2006
Language:
english
DOI:
10.1117/12.686540
File:
PDF, 789 KB
english, 2006