SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Photonic band-gap masks to enhance resolution and depth of focus
Nistler, John, Lercel, Michael J., Duckworth, Koby, Chaloupka, Jiri, Brock, MattVolume:
6517
Year:
2007
Language:
english
DOI:
10.1117/12.712295
File:
PDF, 362 KB
english, 2007