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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Base quencher effects in chemically amplified resist at sub-30-nm fabrication
Henderson, Clifford L., Kozawa, Takahiro, Tagawa, Seiichi, Santillan, Julius Joseph, Toriumi, Minoru, Itani, ToshiroVolume:
6923
Year:
2008
Language:
english
DOI:
10.1117/12.772154
File:
PDF, 176 KB
english, 2008