SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan -...

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SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Alternative technology for double patterning process simplification

Lim, Hee-Youl, Chen, Alek C., Lin, Burn, Jang, Kyo-Young, Kim, Jae-Heon, Yen, Anthony, Lee, Sung-Gu, Park, Sarohan, Kim, Tae-Hwan, Bok, Cheol-Kyu, Moon, Seung-Chan
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Volume:
7140
Year:
2008
Language:
english
DOI:
10.1117/12.804657
File:
PDF, 1.57 MB
english, 2008
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