SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - CD performance evaluation according to advanced marking parameter
Yoon, Suk-Ky, Hosono, Kunihiro, Kim, Seung-Yun, Yeon, Kyoeong-Mee, Lim, Chan, Choi, Sung-Jin, Kim, Lee-Ju, Cho, Young-Rok, Kim, Hong-SeokVolume:
7379
Year:
2009
Language:
english
DOI:
10.1117/12.824317
File:
PDF, 380 KB
english, 2009