SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Feasibility study of the approach to flare, shadowing, optical and process corrections for EUVL OPC
Nikolsky, Peter, Zurbrick, Larry S., Montgomery, M. Warren, Davydova, Natalia, van Ingen Schenau, Koen, van Adrichem, Paul, Hendrickx, Eric, Lorusso, Gian, Jiang, Jiong, Liu, Wei, Liu, HuayuVolume:
7488
Year:
2009
Language:
english
DOI:
10.1117/12.833527
File:
PDF, 367 KB
english, 2009