SPIE Proceedings [SPIE SPIE Optical Engineering + Applications - San Diego, California, United States (Sunday 1 August 2010)] Advances in Metrology for X-Ray and EUV Optics III - Study of 18.2-nm Schwarzschild microscope for plasma diagnostics
Wang, Xin, Assoufid, Lahsen, Takacs, Peter Z., Mu, Baozhong, Huang, Yi, Asundi, Anand K., Zhai, Zirong, Yi, Shengzhen, Jiang, Li, Zhu, Jingtao, Wang, Zhanshan, Liu, Hongjie, Cao, Leifeng, Gu, YuqiuVolume:
7801
Year:
2010
Language:
english
DOI:
10.1117/12.860281
File:
PDF, 1.43 MB
english, 2010