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SPIE Proceedings [SPIE Microlithography Conference - Santa Clara, CA (Monday 2 March 1987)] Advances in Resist Technology and Processing IV - Dynalith ® Resists For Mid-Uv Applications: * Formulation Optimization For Gaas Related Processing
Lazarus, Richard M., Dixit, Sunit S., Bowden, Murrae J.Volume:
771
Year:
1987
Language:
english
DOI:
10.1117/12.940341
File:
PDF, 30.39 MB
english, 1987