SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Picosecond Electron-Beam And Synchrotron Radiation Pulse Radiolysis For Studies On Electron-Beam And X-Ray Resists
Yoshida, Yoichi, Shibata, Hiromi, Tagawa, Seiichi, Washio, Masakazu, Tabata, Yoneho, Kouchi, Noriyuki, Ogata, Atsushi, Reichmanis, ElsaVolume:
1086
Year:
1989
Language:
english
DOI:
10.1117/12.953039
File:
PDF, 304 KB
english, 1989