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Silicon–germanium interdiffusion in strained Ge/SiGe multiple quantum well structures
Liu, Xue-Chao, Leadley, D RVolume:
44
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/44/7/079501
Date:
February, 2011
File:
PDF, 100 KB
english, 2011