Fabrication of Amorphous Silicon Carbide Films from Decomposition of Tetramethylsilane using ECR plasma of Ar
Ito, H, Onitsuka, S, Gappa, R, Saitoh, H, Roacho, R, Pannell, K H, Suzuki, T, Niibe, M, Kanda, KVolume:
441
Language:
english
Journal:
Journal of Physics: Conference Series
DOI:
10.1088/1742-6596/441/1/012039
Date:
June, 2013
File:
PDF, 753 KB
english, 2013