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SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II - Resist cross-sectioning using focused ion beams
Vasile, Michael J., Peckerar, Martin C.Volume:
1671
Year:
1992
Language:
english
DOI:
10.1117/12.136033
File:
PDF, 611 KB
english, 1992