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SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - Assessment of high-contrast G- and I-line resists using high-numerical-aperture exposure tools
Gutmann, Alois, Binder, Johann, Czech, Guenther, Karl, Juergen, Mader, Leonhard, Sarlette, Daniel, Henke, Wolfgang, Pol, VictorVolume:
1264
Year:
1990
Language:
english
DOI:
10.1117/12.20178
File:
PDF, 733 KB
english, 1990