SPIE Proceedings [SPIE 17th Annual BACUS Photomask Technology and Management - Redwood City, CA (Wednesday 17 September 1997)] 17th Annual BACUS Symposium on Photomask Technology and Management - Practical approach to evaluating mask CD uniformity patterned by a variable-shaped beam
Yoshitake, Shusuke, Ogawa, Yoji, Sakurai, Hideaki, Itoh, Masamitsu, Higashikawa, Iwao, Nakayamada, Noriaki, Matsuki, Kazuto, Tamamushi, Shuichi, Reynolds, James A., Grenon, Brian J.Volume:
3236
Year:
1998
Language:
english
DOI:
10.1117/12.301200
File:
PDF, 469 KB
english, 1998