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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Emerging Lithographic Technologies II - Surface chemistry of GaAs wafers and reaction with chemically amplified resists during resist processing
Lu, Bing, Vladimirsky, Olga, Taylor, James W., Dandekar, Niru V., Vladimirsky, YuliVolume:
3331
Year:
1998
Language:
english
DOI:
10.1117/12.309610
File:
PDF, 415 KB
english, 1998