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SPIE Proceedings [SPIE Advanced High-Power Lasers and Applications - Osaka, Japan (Monday 1 November 1999)] High-Power Lasers in Manufacturing - Stereolithography with XeCl excimer laser/lamp
Satoh, Saburoh, Tanaka, Takao, Ihara, Satoshi, Yamabe, Chobei, Chen, Xiangli, Fujioka, Tomoo, Matsunawa, AkiraVolume:
3888
Year:
2000
Language:
english
DOI:
10.1117/12.377028
File:
PDF, 949 KB
english, 2000