SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Use of intentional-defect wafers for tool inspection validation
Jarvis, Richard J., Chua, Christine, Sullivan, Neal T.Volume:
3998
Year:
2000
Language:
english
DOI:
10.1117/12.386485
File:
PDF, 1.27 MB
english, 2000