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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Study of bilayer negative-tone silylation process for 193-nm lithography
Watanabe, Hiroyuki, Satou, Isao, Endo, Masayuki, Morimoto, Hiroaki, Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388261
File:
PDF, 1.51 MB
english, 2000