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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - Optimization of fabrication process for dual-trench-type alternating PSM
Komizo, Tooru, Kagami, Ichiro, Kakuta, Daichi, Kawahira, Hiroichi, Kawahira, HiroichiVolume:
4409
Year:
2001
Language:
english
DOI:
10.1117/12.438341
File:
PDF, 383 KB
english, 2001