SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - Predicting overlay performance for electron projection lithography masks
Reu, Phillip L., Chen, Cheng-Fu, Engelstad, Roxann L., Lovell, Edward G., Lercel, Michael J., Wood II, Obert R., Mackay, R. S., Engelstad, Roxann L.Volume:
4688
Year:
2002
Language:
english
DOI:
10.1117/12.472280
File:
PDF, 723 KB
english, 2002