SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Effect of various ArF resist shrinkage amplitudes on CD bias
Ke, Chih-Ming, Gau, Tsai-Sheng, Chen, Pei-Hung, Yen, Anthony, Lin, Burn J., Otaka, Tadashi, Iizumi, Takashi, Sasada, Katsuhiro, Ueda, Kazuo, Herr, Daniel J. C.Volume:
4689
Year:
2002
Language:
english
DOI:
10.1117/12.473428
File:
PDF, 631 KB
english, 2002