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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination
Petersen, John S., Conley, Will, Roman, Bernard J., Litt, Lloyd C., Lucas, Kevin, Wu, Wei, Van Den Broeke, Douglas J., Chen, J. Fung, Laidig, Thomas L., Wampler, Kurt E., Gerold, David J., Socha, RobeVolume:
4691
Year:
2002
Language:
english
DOI:
10.1117/12.474599
File:
PDF, 554 KB
english, 2002