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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - New concept of specification for mask flatness
Itoh, Masamitsu, Inoue, Soichi, Okumura, Katsuya, Hagiwara, Tsuneyuki, Moriya, Jiro, Kawahira, HiroichiVolume:
4754
Year:
2002
Language:
english
DOI:
10.1117/12.476957
File:
PDF, 940 KB
english, 2002