SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Application of CPL reticle technology for the 65- and 50-nm node
Conley, Will, Van Den Broeke, Douglas J., Socha, Robert J., Wu, Wei, Litt, Lloyd C., Lucas, Kevin, Nelson-Thomas, Carla M., Roman, Bernard J., Chen, J. Fung, Wampler, Kurt E., Laidig, Thomas L., Hsu,Volume:
5040
Year:
2003
Language:
english
DOI:
10.1117/12.485515
File:
PDF, 500 KB
english, 2003