SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Preliminary results of EB stepper in the application of 65-nm process
Takenaka, Hiroshi, Mackay, R. Scott, Koike, Kaoru, Tsuchida, Takahiro, Koba, Fumihiro, Sakaue, Hiroshi, Yamabe, MasakiVolume:
5374
Year:
2004
Language:
english
DOI:
10.1117/12.534875
File:
PDF, 1.79 MB
english, 2004