SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Modified procedure for evaluation of low-k1 process windows
Park, Dong-Woon, Smith, Bruce W., Lee, Sook, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-SungVolume:
5377
Year:
2004
Language:
english
DOI:
10.1117/12.536338
File:
PDF, 191 KB
english, 2004