SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - The study of high-speed electron beam deflection technology for VSB writers
Hirumi, Junji, Tanabe, Hiroyoshi, Yoshioka, Nobuyuki, Hoshi, Hiromichi, Ando, Hiroyoshi, Tsuchiya, Seiichi, Hoga, MorihisaVolume:
5446
Year:
2004
Language:
english
DOI:
10.1117/12.557759
File:
PDF, 214 KB
english, 2004