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SPIE Proceedings [SPIE Optical Science and Technology, the SPIE 49th Annual Meeting - Denver, CO (Monday 2 August 2004)] Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II - Wave-optical and ray-tracing analysis to establish a compact two-dimensional focusing unit using K-B mirror arrangement
Matsuyama, Satoshi, Khounsary, Ali M., Dinger, Udo, Mimura, Hidekazu, Yamamura, Kazuya, Ota, Kazuya, Yumoto, Hirokatsu, Sano, Yasuhisa, Endo, Katsuyoshi, Mori, Yuzo, Yabashi, Makina, Tamasaku, Kenji,Volume:
5533
Year:
2004
Language:
english
DOI:
10.1117/12.567515
File:
PDF, 407 KB
english, 2004