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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Focused ion beam repair of binary chrome defects for the 65-nm node
Ferranti, David C., Staud, Wolfgang, Weed, J. Tracy, Marshman, Jeffrey G., Lanphear, Roth W., Donahue, Kenneth G., Bachman, Stephen A., Szelag, Sharon M.Volume:
5567
Year:
2004
Language:
english
DOI:
10.1117/12.578098
File:
PDF, 368 KB
english, 2004