SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Evaluation of a novel photoacid generator for chemically amplified photoresist with ArF exposure
Asakura, Toshikage, Sturtevant, John L., Yamato, Hitoshi, Hintermann, Tobias, Ohwa, MasakiVolume:
5753
Year:
2005
Language:
english
DOI:
10.1117/12.600327
File:
PDF, 191 KB
english, 2005