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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Effectiveness of mask data process using OASIS format
Tabara, Katsuji, Komuro, Masanori, Sakurai, Mitsuo, Makino, Seiji, Itoh, Takahisa, Okada, TomoyukiVolume:
5853
Year:
2005
Language:
english
DOI:
10.1117/12.617148
File:
PDF, 253 KB
english, 2005