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SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Image imbalance compensation in alternating phase-shift masks towards the 45nm node through-pitch imaging
Van Look, Lieve, Weed, J. Tracy, Martin, Patrick M., Kasprowicz, Bryan, Zibold, Axel, Degel, Wolfgang, Vandenberghe, GeertVolume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.632112
File:
PDF, 612 KB
english, 2005