SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Design and Process Integration for Microelectronic Manufacturing IV - Highly accurate hybrid-OPC method for sub-60nm memory device
Yune, Hyoung-Soon, Wong, Alfred K. K., Singh, Vivek K., Kim, Cheol-Kyun, Ahn, Yeong-Bae, Nam, Byung-Ho, Yim, DonggyuVolume:
6156
Year:
2006
Language:
english
DOI:
10.1117/12.656853
File:
PDF, 317 KB
english, 2006