SPIE Proceedings [SPIE 22nd European Mask and Lithography Conference - Dresden, Germany (Monday 23 January 2006)] 22nd European Mask and Lithography Conference - Spot sensor enabled reticle uniformity measurements for 65nm CDU analysis with scatterometry
Janssen, Maurice, van Ingen Schenau, Koen, van der Laan, HansVolume:
6281
Year:
2006
Language:
english
DOI:
10.1117/12.692636
File:
PDF, 314 KB
english, 2006