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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - OCD metrology by floating n/k
Yu, Shinn-Sheng, Archie, Chas N., Huang, Jacky, Ke, Chih-Ming, Gau, Tsai-Sheng, Lin, Burn J., Yen, Anthony, Lane, Lawrence, Vuong, Vi, Chen, YanVolume:
6518
Year:
2007
Language:
english
DOI:
10.1117/12.713341
File:
PDF, 1.13 MB
english, 2007